A university materials and physics laboratory applied the CK450B Magnetron Sputtering Coating System for research on nanofilms, semiconductor films and functional films. The equipment is equipped with 3×3-inch magnetron targets, supports 600℃ programmable heating, sample rotation + revolution, and −200V substrate bias, enabling high-quality single/multi-layer functional film deposition.

In actual use, the system reaches an ultimate vacuum of 6.7×10⁻⁵Pa with low leakage rate, ensuring clean and dense films. Through the intelligent computer control system, customers realized fixed-point coating, real-time data acquisition and programmable temperature ramps, meeting high-temperature in-situ growth and micro-area fabrication requirements. The substrate bias significantly improves film adhesion and uniformity.

The machine runs stably and safely, serving as a core platform for preparing hard films, metal films, optical films and superconducting films, greatly improving research efficiency.

Core Operating Parameters